Trace determination of iron on a silicon wafer surface by silicon direct bonding and neutron activation analysis

被引：0
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作者：
Shigematsu, T. [1 ]
Polasek, M. [1 ]
Yonezawa, H. [1 ]
机构：
[1] NTT Interdisciplinary Research Laboratories, Nippon Telegraph and Telephone Corporation, Tokai, Ibaraki-ken, 319-11, Japan
来源：
Journal of Radioanalytical and Nuclear Chemistry | 1996年 / 203卷 / 01期
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页码：3 / 9
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