CHEMICAL DISSOLUTION OF UNREACTED FREE SILICON IN SILICON NITRIDE.

被引：0

作者：

Bartosiewicz, Leslie

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来源：

Praktische Metallographie/Practical Metallography | 1976年 / 13卷 / 08期

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CERAMIC MATERIALS - Chemical Analysis;

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摘要：

The search for a chemical method for selective and reproducible determination of the free (unreacted) silicon in silicon nitrides has led to the development of a generally applicable reagent that removes the free silicon from sections of polished samples. The etchant used is 60 ml HNO//3, 25 ml HF, and 3 to 5 drops of 30% hydrogen peroxide. The technique and the limitations of the analysis are discussed.

引用

页码：379 / 382

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