Fabrication of ultrafine x-ray mask using precise crystal growth technique

被引：0
|
作者：
Miyamoto, Yasuyuki [1 ]
Furuya, Kazuhito [1 ]
Yamazaki, Daisuke [1 ]
机构：
[1] Tokyo Inst of Technology, Tokyo, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1992年 / 31卷 / 4 A期
关键词：
10;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：432 / 435
相关论文
共 50 条
  • [21] Optimization of the refractory x-ray mask fabrication sequence
    Cummings, K.D.
    Dauksher, W.J.
    Johnson, W.A.
    Laudon, M.F.
    Engelstad, R.
    Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1996, 14 (06):
  • [22] Fabrication of intermediate mask for deep x-ray lithography
    Sheu J.T.
    Chiang M.H.
    Su S.
    Microsystem Technologies, 1998, 4 (2) : 74 - 76
  • [23] Fabrication of intermediate mask for deep x-ray lithography
    Sheu, JT
    Chiang, MH
    Su, S
    MICROSYSTEM TECHNOLOGIES, 1998, 4 (02) : 74 - 76
  • [24] Fabrication and evaluation of a grayscale mask for x-ray lithography using MEMS technology
    Mekaru, Harutaka
    Takano, Takayuki
    Awazu, Koichi
    Takahashi, Masaharu
    Maeda, Ryutaro
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2008, 7 (01):
  • [25] Fabrication of a needle array using a Si gray mask for x-ray lithography
    Mekaru, Harutaka
    Takano, Takayuki
    Awazu, Koichi
    Takahashi, Masaharu
    Maeda, Ryutaro
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (06): : 2196 - 2201
  • [26] Development of X-ray mask fabrication process using W-sputtering
    Lee, T
    Lee, S
    Ahn, J
    METALS AND MATERIALS-KOREA, 1997, 3 (04): : 272 - 276
  • [27] Development of x-ray mask fabrication process using w-sputtering
    Taeho Lee
    Seungyoon LeE
    Jinho Ahn
    Metals and Materials, 1997, 3 : 272 - 276
  • [28] Fabrication of high precision X-ray mask using silicon dry etching
    Noda, Daiji
    Tsuji, Hiroshi
    Yashiro, Wataru
    Shimada, Kazuma
    Hattori, Tadashi
    MICROPROCESSES AND NANOTECHNOLOGY 2007, DIGEST OF PAPERS, 2007, : 364 - +
  • [29] MASK ALIGNMENT FOR FABRICATION OF INTEGRATED-CIRCUITS USING X-RAY LITHOGRAPHY
    MCCOY, JH
    SULLIVAN, PA
    SOLID STATE TECHNOLOGY, 1976, 19 (09) : 59 - 64
  • [30] Improvements in graphite-based X-ray mask fabrication for ultradeep X-ray lithography
    R. Divan
    D.C. Mancini
    S.M. Gallagher
    J. Booske
    D. Van der Weide
    Microsystem Technologies, 2004, 10 : 728 - 734
12345