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- [1] FABRICATION OF ULTRAFINE X-RAY MASK USING PRECISE CRYSTAL-GROWTH TECHNIQUE JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1992, 31 (4A): : L432 - L435
- [2] NANOMETER X-RAY MASK CREATED USING PRECISE CRYSTAL-GROWTH INSTITUTE OF PHYSICS CONFERENCE SERIES, 1992, (127): : 119 - 122
- [3] 1 nm x-ray lithography using novel mask fabrication technique REVIEW OF SCIENTIFIC INSTRUMENTS, 1998, 69 (09): : 3350 - 3352
- [4] X-RAY MASK FABRICATION PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1982, 333 : 111 - 112
- [5] Fabrication of X-ray mask by using diamond membrane Weixi Jiagong Jishu/Microfabrication Technology, 1998, (01): : 37 - 42
- [6] Precise stress control of Ta absorber using low stress alumina etching mask for X-ray mask fabrication JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (12B): : 6463 - 6468
- [7] Fabrication of a Si stencil mask for the X-ray lithography using a dry etching technique INTERNATIONAL MEMS CONFERENCE 2006, 2006, 34 : 859 - 864
- [8] X-ray mask fabrication at CXrL EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 56 - 62
- [9] Ultrafine pattern x-ray mask fabricated using the sidewall method JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (05): : 3391 - 3392
- [10] X-RAY MASK FABRICATION USING ADVANCED OPTICAL LITHOGRAPHY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2994 - 2996