n-AlGaSb and GaSb/AlGaSb double-heterostructure lasers grown by organometallic vapor phase epitaxy

被引:0
|
作者
Massachusetts Inst of Technology, Lexington, United States [1 ]
机构
来源
Appl Phys Lett | / 3卷 / 400-402期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [41] GaInAsSb/AlGaAsSb multiple-quantum-well diode lasers grown by organometallic vapor phase epitaxy
    Wang, CA
    Choi, HK
    APPLIED PHYSICS LETTERS, 1997, 70 (07) : 802 - 804
  • [42] STUDY OF DEFECTS IN A RAPIDLY DEGRADED INGAASP INGAP DOUBLE-HETEROSTRUCTURE LASER GROWN BY LIQUID-PHASE EPITAXY
    UEDA, O
    WAKAO, K
    YAMAGUCHI, A
    KOMIYA, S
    ISOZUMI, S
    NISHI, H
    UMEBU, I
    APPLIED PHYSICS LETTERS, 1984, 44 (09) : 861 - 863
  • [43] AlGaN/GaN heterostructure grown by metalorganic vapor phase epitaxy
    Qu, JQ
    Li, J
    Zhang, GY
    SOLID STATE COMMUNICATIONS, 1998, 107 (09) : 467 - 470
  • [44] CONTINUOUS ROOM-TEMPERATURE OPERATION OF GA(1-X)ALXAS-GAAS DOUBLE-HETEROSTRUCTURE LASERS GROWN BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION
    DUPUIS, RD
    DAPKUS, PD
    APPLIED PHYSICS LETTERS, 1978, 32 (07) : 406 - 407
  • [45] CHARACTERIZATION OF INGAASP INP DOUBLE-HETEROSTRUCTURE WAFERS GROWN BY METALORGANIC VAPOR-PHASE EPITAXY FOR SEMICONDUCTOR-LASERS BY PHOTOLUMINESCENCE INVESTIGATION WITH HIGH-POWER YAG-LASER EXCITATION
    NAKAO, M
    SATO, K
    OISHI, M
    ITAYA, Y
    IMAMURA, Y
    JOURNAL OF APPLIED PHYSICS, 1988, 63 (05) : 1722 - 1728
  • [46] Characteristics of GaSb and GaInSb layers grown by metalorganic vapor phase epitaxy
    Ehsani, H
    Bhat, I
    Hitchcock, C
    Borrego, J
    Gutmann, R
    SECOND NREL CONFERENCE ON THERMOPHOTOVOLTAIC GENERATION OF ELECTRICITY, 1996, (358): : 423 - 433
  • [47] Structural effects of carbon in GaSb grown by metalorganic vapor phase epitaxy
    Watkins, SP
    Wiersma, RD
    Wang, CX
    Pitts, OJ
    Bolognesi, CR
    JOURNAL OF CRYSTAL GROWTH, 2003, 248 : 274 - 278
  • [48] Advantage of heteroepitaxial GaSb thin-film buffer and GaSb dot nucleation layer for GaSb/AlGaSb multiple quantum well structure grown on Si(100) substrate by molecular beam epitaxy
    Machida, Ryuto
    Akahane, Kouichi
    Watanabe, Issei
    Hara, Shinsuke
    Fujikawa, Sachie
    Kasamatsu, Akifumi
    Fujishiro, Hiroki I.
    JOURNAL OF CRYSTAL GROWTH, 2019, 507 : 357 - 361
  • [49] BURIED WAVE-GUIDE DOUBLE-HETEROSTRUCTURE PBEUSE-LASERS GROWN BY MBE
    SCHLERETH, KH
    SPANGER, B
    BOTTNER, H
    LAMBRECHT, A
    TACKE, M
    INFRARED PHYSICS, 1990, 30 (05): : 449 - 454
  • [50] SELECTIVELY EMBEDDED GROWTH BY CHEMICAL BEAM EPITAXY FOR THE FABRICATION OF INGAAS/INP DOUBLE-HETEROSTRUCTURE LASERS
    GOTODA, M
    SUGIMOTO, H
    NOMURA, Y
    ISU, T
    NUNOSHITA, M
    MARUNO, S
    JOURNAL OF CRYSTAL GROWTH, 1994, 140 (3-4) : 277 - 281