Melting and crystallization behavior of low-pressure chemical-vapor-deposition amorphous Si films during excimer-laser annealing

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[1] [1,Voogt, F.C.
[2] Ishihara, R.
[3] Tichelaar, F.D.
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Voogt, F.C. (frans.voogt@philips.com) | 1600年 / American Institute of Physics Inc.卷 / 95期
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