High-energy ion beam analysis of ferroelectric thin films

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Osaka Univ, Osaka, Japan [1 ]
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Appl Surf Sci | / 453-458期
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The authors would like to acknowledget he VTT; Technical Research Center of Finland for providing the RBS simulation code of Gisa 3.99. Part of this work was supportedb y a Grant-in-Aid for Scientific Research from the Ministry of Education; Science; Sports and Culture; Japan. This work was carried out at the Ion Beam Surface Analysis Facility of Osaka University funded by the Ministry of Education; Japan;
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