Low-temperature instability of thermal silicon dioxide porous films optical constants

被引:0
|
作者
机构
[1] Zakharov, L.M.
[2] Skupov, V.D.
来源
Zakharov, L.M. | 1600年 / Mezhdunarodnaya Kniga, Moscow, Russian Federation卷 / 24期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [11] USE OF LOW-TEMPERATURE DEPOSITED SILICON DIOXIDE FILMS AS DIFFUSION MASKS IN GAAS
    ING, SW
    DAVERN, W
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (01) : 120 - 122
  • [12] Low-temperature deposition of silicon dioxide films in high-density plasma
    Yasunas, A.
    Kotov, D.
    Shiripov, V.
    Radzionay, U.
    SEMICONDUCTOR PHYSICS QUANTUM ELECTRONICS & OPTOELECTRONICS, 2013, 16 (02) : 216 - 219
  • [13] CHARGE TRANSPORT IN MOS-STRUCTURES WITH LOW-TEMPERATURE SILICON DIOXIDE FILMS
    BELOUSOV, II
    EFIMOV, VM
    SINITSA, SP
    VORONTSOV, VV
    SHKLYAEV, AA
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1991, 125 (01): : 387 - 398
  • [14] Evolution of optical constants of silicon dioxide on silicon from ultrathin films to thick films
    Cai, Qing-Yuan
    Zheng, Yu-Xiang
    Mao, Peng-Hui
    Zhang, Rong-Jun
    Zhang, Dong-Xu
    Liu, Ming-Hui
    Chen, Liang-Yao
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2010, 43 (44)
  • [15] CONTROL OF TITANIUM-SILICON AND SILICON DIOXIDE REACTIONS BY LOW-TEMPERATURE RAPID THERMAL ANNEALING
    BRILLSON, LJ
    SLADE, ML
    RICHTER, HW
    VANDERPLAS, H
    FULKS, RT
    APPLIED PHYSICS LETTERS, 1985, 47 (10) : 1080 - 1082
  • [16] Low-temperature thermal expansion of silicon
    Sugino, Ken-ichi
    Okazaki, Atsushi
    1600, (29):
  • [17] LOW-TEMPERATURE OXIDATION OF CRYSTALLINE POROUS SILICON
    KATO, Y
    ITO, T
    HIRAKI, A
    APPLIED SURFACE SCIENCE, 1989, 41-2 : 614 - 618
  • [18] LOW-TEMPERATURE CRYSTALLIZATION OF AMORPHOUS SILICON FILMS
    MAA, JS
    LIN, SJ
    THIN SOLID FILMS, 1979, 64 (01) : 63 - 64
  • [19] LOW-TEMPERATURE DEPOSITION OF SILICON OXIDE FILMS
    ALT, LL
    ING, SW
    LAENDLE, KW
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (05) : 465 - 465
  • [20] Low-temperature germanium thin films on silicon
    Sorianello, Vito
    Colace, Lorenzo
    Armani, Nicola
    Rossi, Francesca
    Ferrari, Claudio
    Lazzarini, Laura
    Assanto, Gaetano
    OPTICAL MATERIALS EXPRESS, 2011, 1 (05): : 856 - 865