Low-temperature instability of thermal silicon dioxide porous films optical constants

被引:0
|
作者
机构
[1] Zakharov, L.M.
[2] Skupov, V.D.
来源
Zakharov, L.M. | 1600年 / Mezhdunarodnaya Kniga, Moscow, Russian Federation卷 / 24期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] ON THE STRUCTURE OF LOW-TEMPERATURE PECVD SILICON DIOXIDE FILMS
    DEVINE, RAB
    JOURNAL OF ELECTRONIC MATERIALS, 1990, 19 (11) : 1299 - 1301
  • [2] Characterization of low-temperature PECVD silicon dioxide films
    Deenapanray, PNK
    Lengyel, J
    Tan, HH
    Petravic, M
    Durandet, A
    Williams, JS
    Jagadish, C
    PROPERTIES AND PROCESSING OF VAPOR-DEPOSITED COATINGS, 1999, 555 : 197 - 202
  • [3] Low-temperature growth of PbTe films on porous silicon
    Zimin, SP
    Zimin, DS
    Saunin, IV
    Bondokov, RT
    INORGANIC MATERIALS, 1998, 34 (05) : 440 - 441
  • [4] LOW-TEMPERATURE VUV ENHANCED GROWTH OF THIN SILICON DIOXIDE FILMS
    PATEL, P
    BOYD, IW
    APPLIED SURFACE SCIENCE, 1990, 46 (1-4) : 352 - 356
  • [5] LOW-TEMPERATURE DEPOSITION OF HIGH-QUALITY SILICON DIOXIDE FILMS
    WATATANI, M
    IZAWA, H
    MORIMOTO, H
    AWANE, K
    SHARP TECHNICAL JOURNAL, 1995, (61): : 43 - 46
  • [6] LOW-TEMPERATURE NITRIDATION OF FLUORINATED SILICON DIOXIDE FILMS IN AMMONIA GAS
    ARITOME, S
    MORITA, M
    TANAKA, T
    HIROSE, M
    APPLIED PHYSICS LETTERS, 1987, 51 (13) : 981 - 983
  • [7] LOW-TEMPERATURE DEPOSITION OF SILICON DIOXIDE FILMS BY PHOTOINDUCED DECOMPOSITION OF TETRAETHOXYSILANE
    NIWANO, M
    HIRANO, S
    SUEMITSU, M
    HONMA, K
    MIYAMOTO, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1989, 28 (07): : L1310 - L1313
  • [8] LOW-TEMPERATURE FORMATION OF SILICON DIOXIDE THIN FILMS FOR CAPACITOR APPLICATIONS
    ING, SW
    DAVERN, W
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (08) : C193 - C193
  • [9] OPTICAL-CONSTANTS OF TITANIUM AND SILICON DIOXIDE FILMS
    JANKUJ, J
    CZECHOSLOVAK JOURNAL OF PHYSICS, 1990, 40 (02) : 217 - 223
  • [10] TITANIUM SILICON AND SILICON DIOXIDE REACTIONS CONTROLLED BY LOW-TEMPERATURE RAPID THERMAL ANNEALING
    BRILLSON, LJ
    SLADE, ML
    RICHTER, HW
    VANDERPLAS, H
    FULKS, RT
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 993 - 997