Surface Preparation of III-V Compounds by Reactive Ion Etching in a Methane-Based Gas Mixture.

被引：0
|
作者：
Henry, L. [1 ]
Vaudry, C. [1 ]
Alnot, P. [1 ]
Olivier, J. [1 ]
机构：
[1] CNET, Lannion, Fr, CNET, Lannion, Fr
来源：
Le Vide, les couches minces | 1988年 / 43卷 / 241期
关键词：
GASES; -; IONS; METHANE; ORGANOMETALLICS;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Dry etching techniques are becoming increasingly important, and recently a Metal Organic Reactive Ion Etching (MORIE) process usable in micro-opto-electronic technology has been reported. This process appears usable also for surface treatments; for example, before epitaxial growth.
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页码：169 / 170
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