ELECTRON DENSITY AND POTENTIAL DISTRIBUTION AT A PLASMA-INSULATOR INTERFACE.

被引：0

作者：

Tkharev, E.E. ^{[1
]}

Danilyuk, A.L. ^{[1
]}

机构：

[1] Minsk Radioengineering Inst, Minsk, USSR, Minsk Radioengineering Inst, Minsk, USSR

来源：

| 1600年 / 35期

关键词：

ELECTRON DENSITY - PLASMA-INSULATOR INTERFACE - POTENTIAL DISTRIBUTION;

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摘要：

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页码：4 / 5

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