ELECTRON DENSITY AND POTENTIAL DISTRIBUTION AT A PLASMA-INSULATOR INTERFACE.

被引：0
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作者：
Tkharev, E.E. [1 ]
Danilyuk, A.L. [1 ]
机构：
[1] Minsk Radioengineering Inst, Minsk, USSR, Minsk Radioengineering Inst, Minsk, USSR
来源：
| 1600年 / 35期
关键词：
ELECTRON DENSITY - PLASMA-INSULATOR INTERFACE - POTENTIAL DISTRIBUTION;
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页码：4 / 5
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