共 50 条
- [31] 3-DIMENSIONAL SIMULATIONS OF HIGH-RESOLUTION PHOTORESIST PROCESSING JOURNAL OF IMAGING SCIENCE, 1991, 35 (04): : 240 - 251
- [35] Application of techniques in radiation chemistry to study disinfection byproduct control. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1999, 217 : U730 - U730
- [37] MERGING OF PARTIAL IMAGE AND ITS FINE OBSERVATION USING VIEW CONTROL. Systems, computers, controls, 1981, 12 (05): : 10 - 18
- [38] Verification and (arms) control. Interaction of technology and politics - German - Brinkmann,A INTERNATIONALE POLITIK, 1997, 52 (04): : 59 - 61
- [39] Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography ASCC: 2009 7TH ASIAN CONTROL CONFERENCE, VOLS 1-3, 2009, : 853 - 858
- [40] Laminated photoresist layer technology and residual stress control for micromirror fabrication Guangxue Jingmi Gongcheng/Optics and Precision Engineering, 2008, 16 (11): : 2204 - 2208