SOME FEATURES OF THE ELECTRICAL PROPERTIES OF EPITAXIAL TIN-DOPED GALLIUM ARSENIDE.

被引:0
|
作者
Emel'yanenko, O.V.
Lagunova, T.S.
Radu, R.K.
Talalakin, G.N.
Telegin, A.A.
机构
关键词
D O I
暂无
中图分类号
学科分类号
摘要
The galvanomagnetic properties of tin-doped GaAs films were studied to determine the degree of amphoteric behavior of tin in GaAs and its influence on the principal physical properties.
引用
收藏
页码:665 / 666
相关论文
共 50 条
  • [41] SOME ELECTRICAL PROPERTIES OF EPITAXIAL GERMANIUM FILMS DEPOSITED ON SEMI-INSULATING GALLIUM-ARSENIDE SUBSTRATE
    RYBKA, V
    SEVCIK, Z
    DUDROVA, E
    KREJCI, P
    THIN SOLID FILMS, 1972, 9 (01) : 83 - &
  • [42] Preparation and electrical properties of electrospun tin-doped indium oxide nanowires
    Lin, Dandan
    Wu, Hui
    Zhang, Rui
    Pan, Wei
    NANOTECHNOLOGY, 2007, 18 (46)
  • [43] SOME PROPERTIES OF GALLIUM ARSENIDE
    BARRIE, R
    CUNNELL, FA
    EDMOND, JT
    ROSS, IM
    PHYSICA, 1954, 20 (11): : 1087 - 1090
  • [44] SURFACE ACCUMULATION OF TIN IN TIN-DOPED GALLIUM-ARSENIDE GROWN BY LOW-PRESSURE METALORGANIC VAPOR-PHASE EPITAXY
    SUNDARAM, VS
    ROTH, AP
    WILLIAMS, DF
    YAKIMOVA, R
    APPLIED PHYSICS LETTERS, 1984, 45 (11) : 1196 - 1198
  • [45] THE PROPERTIES OF GALLIUM-ARSENIDE DOUBLY DOPED WITH SILICON AND GERMANIUM OR SILICON AND TIN
    BROZEL, MR
    LAITHWAITE, K
    NEWMAN, RC
    OZBAY, B
    JOURNAL OF CRYSTAL GROWTH, 1980, 50 (03) : 619 - 624
  • [46] Electrical Properties of Tin-doped Zinc Oxide Nanostructures Doped At Different Dopant Concentrations
    Nasir, M. F.
    Zainol, M. N.
    Hannas, M.
    Mamat, M. H.
    Rahman, S. A.
    Rusop, Mohamad
    INTERNATIONAL CONFERENCE ON NANO-ELECTRONIC TECHNOLOGY DEVICES AND MATERIALS (IC-NET 2015), 2016, 1733
  • [47] Special Features of the Behavior of Antimony During Liquid-phase Epitaxy of Gallium Arsenide.
    Ganina, N.V.
    Mil'vidskii, M.G.
    Ukhorskaya, T.A.
    Neorganiceskie materialy, 1981, 17 (09): : 1537 - 1540
  • [48] SOME FEATURES OF SECOND PHASE PRECIPITATES IN CHROMIUM-DOPED GALLIUM ARSENIDE
    GIMELFAR.FA
    GIRICH, BG
    MILVIDSK.MG
    PELEVIN, OV
    FISTUL, VI
    SOVIET PHYSICS SOLID STATE,USSR, 1970, 11 (07): : 1612 - +
  • [49] FABRICATION AND CHARACTERISTICS OF TIN-DOPED N-LAYERS INTO GALLIUM-ARSENIDE BY AN OPEN-TUBE DIFFUSION PROCESS
    LEDAKOVITCH, PJ
    AGARWAL, R
    GHANDHI, SK
    SOLID-STATE ELECTRONICS, 1987, 30 (07) : 681 - 684
  • [50] PROPERTIES OF EPITAXIAL P-TYPE GE-DOPED GALLIUM-ARSENIDE
    MALISOVA, YV
    NIKIFOROVA, MP
    KHLUDKOV, SS
    IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII FIZIKA, 1989, 32 (01): : 65 - 69