Model study of thermal stress-induced voiding in electronic packages

被引:0
|
作者
Michigan Technological Univ, Houghton, United States [1 ]
机构
来源
J Electron Packag, Trans ASME | / 4卷 / 229-233期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] A model study of thermal stress-induced voiding in electronic packages
    Huang, Y
    Hu, KX
    Yeh, CP
    Li, NY
    Hwang, KC
    JOURNAL OF ELECTRONIC PACKAGING, 1996, 118 (04) : 229 - 234
  • [2] Stress-induced voiding study in integrated circuit interconnects
    Hou, Yuejin
    Tan, Cher Ming
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2008, 23 (07)
  • [3] A physically based lifetime model for stress-induced voiding in interconnects
    Zhai, CJ
    Blish, RC
    JOURNAL OF APPLIED PHYSICS, 2005, 97 (11)
  • [4] A physically based lifetime model for stress-induced voiding in interconnects
    Zhai, Charlie Jun
    Blish, Richard Clark
    Journal of Applied Physics, 2005, 97 (11):
  • [5] THE EFFECT OF STRESS-INDUCED VOIDING ON ELECTROMIGRATION
    LYTLE, SA
    OATES, AS
    JOURNAL OF APPLIED PHYSICS, 1992, 71 (01) : 174 - 178
  • [6] Stress-induced voiding in nickel silicide
    Futase, Takuya
    Oashi, Toshiyuki
    Maeda, Hitoshi
    Inaba, Yutaka
    Tanimoto, Hisanori
    MICROELECTRONIC ENGINEERING, 2013, 106 : 116 - 120
  • [7] Suppression of stress-induced voiding in copper interconnects
    Oshima, T
    Hinode, K
    Yamaguchi, H
    Aoki, H
    Torii, K
    Saito, T
    Ishikawa, K
    Noguchi, J
    Fukui, M
    Nakamura, T
    Uno, S
    Tsugane, K
    Murata, J
    Kikushima, K
    Sekisaka, H
    Murakami, E
    Okuyama, K
    Iwasaki, T
    INTERNATIONAL ELECTRON DEVICES 2002 MEETING, TECHNICAL DIGEST, 2002, : 757 - 760
  • [8] Stress-induced voiding in aluminum and copper interconnects
    Hommel, M
    Fischer, AH
    von Glasow, A
    Zitzelsberger, AE
    STRESS-INDUCED PHENOMENA IN METALLIZATION, 2002, 612 : 157 - 168
  • [9] Lifetime prediction model of stress-induced voiding in Cu/low-κ interconnects
    Yokogawa, Shinji
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2014, 53 (05)
  • [10] MECHANISMS OF THERMAL-STRESS RELAXATION AND STRESS-INDUCED VOIDING IN NARROW ALUMINUM-BASED METALLIZATIONS
    KORHONEN, MA
    PASZKIET, CA
    LI, CY
    JOURNAL OF APPLIED PHYSICS, 1991, 69 (12) : 8083 - 8091