Potential of reactively RF sputtered ZnO thin films for the fabrication of microwave filters

被引:0
|
作者
Kollias, A.T. [1 ]
Tsamis, E.D. [1 ]
Avaritsiotis, J.N. [1 ]
机构
[1] Dept. of Elec. and Comp. Engineering, Natl. Technical University of Athens, 9, Iroon Polytechniou St. Zografou, Athens, 15773, Greece
关键词
Crystal filters - Crystal orientation - Crystal resonators - Microwave filters - Optimization - Piezoelectricity - Scanning electron microscopy - Semiconducting glass - Semiconducting silicon - Sputter deposition - X ray diffraction analysis - Zinc oxide;
D O I
10.1155/APEC.23.75
中图分类号
学科分类号
摘要
The piezoelectric properties of reactively sputtered ZnO thin films deposited on glass and silicon substrates were studied in order to assess their potential for the construction of RF overmoded filters. Films of high crystallographic orientation {002}, as shown by XRD measurements and SEM observations, and high value of keff2, calculated with the aid of the BVD model, were obtained after the optimization of the deposition conditions, with highly repetitive properties. Simple devices were designed and constructed on silicon substrates which showed a quality factor of 1000 without the use of a Bragg acoustic reflector, and a temperature drift of -30 ppm/°C.
引用
收藏
页码:75 / 95
相关论文
共 50 条
  • [21] Effect of rf power on the properties of rf magnetron sputtered ZnO:Al thin films
    Saad, M.
    Kassis, A.
    MATERIALS CHEMISTRY AND PHYSICS, 2012, 136 (01) : 205 - 209
  • [22] Influence of RF power on the properties of sputtered ZnO:Al thin films
    Antony, Aldrin
    Carreras, Paz
    Keitzl, Thomas
    Roldan, Ruben
    Nos, Oriol
    Frigeri, Paolo
    Miguel Asensi, Jose
    Bertomeu, Joan
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2010, 207 (07): : 1577 - 1580
  • [23] STRUCTURE AND MAGNETIC-PROPERTIES OF RF REACTIVELY SPUTTERED IRON NITRIDE THIN-FILMS
    CHANG, C
    SIVERTSEN, JM
    JUDY, JH
    IEEE TRANSACTIONS ON MAGNETICS, 1987, 23 (05) : 3636 - 3638
  • [24] ELECTROCHEMICHROMISM OF RF REACTIVELY SPUTTERED TUNGSTEN-OXIDE FILMS
    KANEKO, H
    MIYAKE, K
    TERAMOTO, Y
    JOURNAL OF APPLIED PHYSICS, 1982, 53 (06) : 4416 - 4421
  • [25] SUPERCONDUCTIVITY TRANSITION TEMPERATURES OF RF REACTIVELY SPUTTERED NBN FILMS
    BUTTIG, K
    LIEMERSD.H
    KINDER, H
    REICHELT, K
    JOURNAL OF APPLIED PHYSICS, 1973, 44 (11) : 5069 - 5071
  • [26] Effect of substrate position on Structural, Morphological, and Optical properties of reactively sputtered ZnO thin films
    Kumar, J. Vinoth
    Matsumoto, Y.
    Maldonado, A.
    Olvera, M. de la L.
    2016 13TH INTERNATIONAL CONFERENCE ON ELECTRICAL ENGINEERING, COMPUTING SCIENCE AND AUTOMATIC CONTROL (CCE), 2016,
  • [27] PHASE CHANGES IN THIN REACTIVELY SPUTTERED ALUMINA FILMS
    FRIESER, RG
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (04) : 357 - &
  • [28] Study of reactively sputtered nickel nitride thin films
    Pandey, Nidhi
    Gupta, Mukul
    Stahn, Jochen
    JOURNAL OF ALLOYS AND COMPOUNDS, 2021, 851
  • [29] REACTIVELY SPUTTERED TITANIUM BORIDE THIN-FILMS
    BLOM, HO
    LARSSON, T
    BERG, S
    OSTLING, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (02): : 162 - 165
  • [30] Effect of RF power on the structural and optical properties of RF-sputtered ZnO thin films
    Nkhaili, Lahcen
    El Kissani, Abdelkader
    Ali, Mustapha Ait
    Ijdiyaou, Youssef
    Elmansouri, Abdelmajid
    Elkhalfi, Abdel-Ilah
    Outzourhit, Abdelkader
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2014, 66 (03):