Electrical activity of defects induced by oxygen precipitation in Czochralski-grown silicon wafers

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Mchedlidze, Teimouraz [1 ]
Matsumoto, Kei [1 ]
Asano, Eiichi [1 ]
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[1] Research and Development Department, Komatsu Electronic Metals Co., Ltd., 2612 Shinomiya, Hiratsuka, Kanagawa 254-0014, Japan
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页码:3426 / 3432
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