Droplet laser plasma source for EUV lithography

被引：0
|
作者：
Schriever, G. [1 ]
Richardson, M. [1 ]
Turcu, E. [1 ]
机构：
[1] Univ of Central Florida, Orlando, FL, United States
来源：
Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest | 2000年
关键词：
Dosimetry - Light emission - Light reflection - Mirrors - Neodymium lasers - Optical multilayers - Photolithography - Q switched lasers - Ultraviolet radiation;
D O I：
10.1109/cleo.2000.907165
中图分类号：
学科分类号：
摘要：
A detailed quantitative study of the water droplet laser plasma source was carried with a 100-Hz laser, that characterizes the radiation efficiency and the long-term operation. Results show that the droplet laser plasma source comes close to satisfying all the near-term needs of extreme ultraviolet lithography (EUVL).
引用
收藏
页码：393 / 394
相关论文
共 50 条
  • [41] Xenon Discharge-Produced Plasma Radiation Source for EUV Lithography
    Zhang, C. H.
    Lv, P.
    Zhao, Y. P.
    Wang, Q.
    Katsuki, S.
    Namihira, T.
    Horta, H.
    Imamura, H.
    Kondo, Y.
    Akiyama, H.
    IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, 2010, 46 (04) : 1661 - 1666
  • [42] Optimization of a dense plasma focus device as a light source for EUV lithography
    Fomenkov, IV
    Partlo, WN
    Ness, RM
    Oliver, IR
    Melnychuk, ST
    Khodykin, OV
    Böwering, NR
    EMERGING LITHOGRAPHIC TECHNOLOGIES VI, PTS 1 AND 2, 2002, 4688 : 634 - 647
  • [43] Plasma Source Enables High-Volume Manufacturing with EUV Lithography
    Alibrandi, Phil
    PHOTONICS SPECTRA, 2011, 45 (09) : 59 - 61
  • [44] Laser-driven xenon plasma emitting at 11.2 nm could be new EUV lithography light source
    不详
    LASER FOCUS WORLD, 2019, 55 (10): : 7 - 7
  • [45] EUV lithography - Laser-produced-plasma sources shine brighter
    Marx, B
    LASER FOCUS WORLD, 2003, 39 (04): : 34 - +
  • [46] Capillary discharge source for EUV lithography
    Cachoncinlle, C
    Robert, E
    Sarroukh, O
    Gonthiez, T
    Viladrosa, R
    Fleurier, C
    Pouvesle, JM
    JOURNAL DE PHYSIQUE IV, 2003, 108 : 169 - 172
  • [47] A new light source for EUV lithography
    Das, Saswato R.
    IEEE SPECTRUM, 2008, 45 (03) : 14 - 14
  • [48] EUV Source Design Flexibility for Lithography
    Nishikawa, T.
    Sunahara, A.
    Sasaki, A.
    Nishihara, K.
    5TH INTERNATIONAL CONFERENCE ON INERTIAL FUSION SCIENCES AND APPLICATIONS (IFSA2007), 2008, 112
  • [49] High-brightness EUV source based on laser plasma using a liquid-metal droplet target
    Vinokhodov, A. Yu.
    Krivokorytov, M. S.
    Sidelnikov, Yu. V.
    Krivtsun, V. M.
    Medvedev, V. V.
    Koshelev, K. N.
    QUANTUM ELECTRONICS, 2016, 46 (05) : 473 - 480
  • [50] Source collection optics for EUV lithography
    Marczuk, P
    Egle, W
    ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II, 2004, 5533 : 145 - 156
12345