Droplet laser plasma source for EUV lithography

被引：0
|
作者：
Schriever, G. [1 ]
Richardson, M. [1 ]
Turcu, E. [1 ]
机构：
[1] Univ of Central Florida, Orlando, FL, United States
来源：
Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest | 2000年
关键词：
Dosimetry - Light emission - Light reflection - Mirrors - Neodymium lasers - Optical multilayers - Photolithography - Q switched lasers - Ultraviolet radiation;
D O I：
10.1109/cleo.2000.907165
中图分类号：
学科分类号：
摘要：
A detailed quantitative study of the water droplet laser plasma source was carried with a 100-Hz laser, that characterizes the radiation efficiency and the long-term operation. Results show that the droplet laser plasma source comes close to satisfying all the near-term needs of extreme ultraviolet lithography (EUVL).
引用
收藏
页码：393 / 394
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