Study on the interface reduction of Cr/SiO2 film

被引：0

作者：

Zhu, Yongfa ^{[1
]}

Mao, Dong ^{[1
]}

Cao, Lili ^{[1
]}

机构：

[1] Tsinghua Univ, Beijing, China

来源：

Zhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology | 1996年 / 16卷 / 02期

关键词：

D O I：

暂无

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学科分类号：

摘要：

(Edited Abstract)

引用

页码：81 / 86

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