Ion energy distribution in H2/Ar plasma in a planar inductive discharge

被引:0
|
作者
Gudmundsson, J.T. [1 ]
机构
[1] Univ of California, Berkeley, United States
来源
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:58 / 64
相关论文
共 50 条
  • [31] Hydropyrolysis of light hydrocarbons in H2/Ar plasma jet
    Chen, HG
    Xie, KC
    PETROLEUM SCIENCE AND TECHNOLOGY, 2003, 21 (5-6) : 709 - 717
  • [32] Study on coal pyrolysis in Ar/H2 plasma jet
    Chen, HG
    Tian, YJ
    Li, F
    Zhu, SY
    Xie, KC
    PROSPECTS FOR COAL SCIENCE IN THE 21ST CENTURY, 1999, : 745 - 748
  • [33] Simulation of coal conversion in Ar/H2 plasma jet
    Tian, YJ
    Chen, HG
    Bao, WR
    Li, F
    Zhu, SY
    Xie, KC
    PROSPECTS FOR COAL SCIENCE IN THE 21ST CENTURY, 1999, : 749 - 752
  • [34] Influence of granularity on coal pyrolysis in Ar/H2 plasma
    Lu, Yong-Kang
    Tian, Yuan-Yu
    Wang, Da-Zhi
    Xie, Ke-Chang
    Zhu, Su-Yu
    Ranliao Huaxue Xuebao/Journal of Fuel Chemistry and Technology, 2002, 30 (03):
  • [35] On the mechanism of copper oxide reduction by dielectric barrier discharge plasma using H2 and Ar mixture gases
    Xu, Zhijian
    Qi, Bin
    Di, Lanbo
    MATERIAL DESIGN, PROCESSING AND APPLICATIONS, PARTS 1-4, 2013, 690-693 : 1664 - 1667
  • [36] Low energy electron heating and evolution of the electron energy distribution by diluted O2 in an inductive Ar/O2 mixture discharge
    Lee, Hyo-Chang
    Lee, Min-Hyong
    Chung, Chin-Wook
    PHYSICS OF PLASMAS, 2010, 17 (01)
  • [37] CRITICAL FIELDS AND STRUCTURE OF ION-ACOUSTIC INSTABILITY OF PLASMA OF AN INDUCTION HIGH-FREQUENCY DISCHARGE IN H2, AR, AND HG IN A MAGNETIC FIELD
    VDOVIN, VL
    RUSANOV, VD
    FRANKKAM.DA
    JETP LETTERS-USSR, 1969, 10 (03): : 76 - &
  • [38] Spatial measurements of electron energy distribution and plasma parameters in a weakly magnetized inductive discharge
    Kim, Young-Do
    Lee, Young-Kwang
    Lee, Hyo-Chang
    Chung, Chin-Wook
    PHYSICS OF PLASMAS, 2013, 20 (02)
  • [39] Characterization of gliding arc discharge using H2/Ar gas mixture
    Choi, Jeongan
    Choi, Seongil
    Song, Young-Hoon
    Lee, Dae Hoon
    INTERNATIONAL JOURNAL OF HYDROGEN ENERGY, 2025, 106 : 888 - 895
  • [40] Inductively coupled plasma-reactive ion etching of InSb using CH4/H2/Ar plasma
    Zhang, Guo-Dong
    Sun, Wei-Guo
    Xu, Shu-Li
    Zhao, Hong-Yan
    Su, Hong-Yi
    Wang, Hai-Zhen
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2009, 27 (04): : 681 - 685