共 50 条
- [21] Magnetic induction and plasma impedance in a planar inductive discharge PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (02): : 83 - 95
- [22] Oxidation control in atmospheric plasma spraying: Comparison between Ar/H2/He and Ar/H2 mixtures THERMAL SPRAY, VOLS 1 AND 2: MEETING THE CHALLENGES OF THE 21ST CENTURY, 1998, : 809 - 814
- [23] The effect of the H2 density on the electron energy distribution in H- ion sources REVIEW OF SCIENTIFIC INSTRUMENTS, 2013, 84 (09):
- [25] Reactive ion etching of ZnSe, ZnSSe, ZnCdSe and ZnMgSSe by H2/Ar and CH4/H2/Ar JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (6A): : 3308 - 3313
- [26] Reactive ion etching of ZnSe, ZnSSe, ZnCdSe and ZnMgSSe by H2/Ar and CH4/H2/Ar Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2000, 39 (6 A): : 3308 - 3313
- [29] Ion composition of rf CCP in Ar/H2 mixtures PLASMA SOURCES SCIENCE & TECHNOLOGY, 2019, 28 (09):