Evaluation method of precipitated oxygen concentration in low resistivity silicon wafers using x-ray diffraction

被引：0
|
作者：
Takeno, Hiroshi [1 ]
Mizuno, Michihiro [1 ]
Ushio, Satoshi [1 ]
Takenaka, Takao [1 ]
机构：
[1] Shin-Etsu Handotai Co, Ltd, Gunma, Japan
来源：
Materials Science Forum | 1995年 / 196-201卷 / pt 4期
关键词：
X ray diffraction;
D O I：
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学科分类号：
摘要：
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页码：1865 / 1870
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