Evaluation method of precipitated oxygen concentration in low resistivity silicon wafers using x-ray diffraction

被引：0
|
作者：
Takeno, Hiroshi [1 ]
Mizuno, Michihiro [1 ]
Ushio, Satoshi [1 ]
Takenaka, Takao [1 ]
机构：
[1] Shin-Etsu Handotai Co, Ltd, Gunma, Japan
来源：
Materials Science Forum | 1995年 / 196-201卷 / pt 4期
关键词：
X ray diffraction;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：1865 / 1870
相关论文
共 50 条
  • [21] High-resolution X-ray diffraction of silicon at low temperatures
    Lu, Z.
    Munakata, K.
    Kohno, A.
    Soejima, Y.
    Nuovo Cimento Della Societa Italiana Di Fisica. D, Condensed Matter, Atomic, Molecular and Chemical Physics, Biophysics, 19 (2-4):
  • [22] High-resolution X-ray diffraction of silicon at low temperatures
    Lu, Z
    Munakata, K
    Kohno, A
    Soejima, Y
    Okazaki, A
    NUOVO CIMENTO DELLA SOCIETA ITALIANA DI FISICA D-CONDENSED MATTER ATOMIC MOLECULAR AND CHEMICAL PHYSICS FLUIDS PLASMAS BIOPHYSICS, 1997, 19 (2-4): : 305 - 311
  • [23] Characterization of strained Si wafers by X-ray diffraction techniques
    Shimura, Takayoshi
    Kawamura, Kohta
    Asakawa, Masahiro
    Watanabe, Heiji
    Yasutake, Kiyoshi
    Ogura, Atsushi
    Fukuda, Kazunori
    Sakata, Osami
    Kimura, Shigeru
    Edo, Hiroki
    Iida, Satoshi
    Umeno, Masataka
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2008, 19 (Suppl 1) : S189 - S193
  • [24] Characterization of strained Si wafers by X-ray diffraction techniques
    Takayoshi Shimura
    Kohta Kawamura
    Masahiro Asakawa
    Heiji Watanabe
    Kiyoshi Yasutake
    Atsushi Ogura
    Kazunori Fukuda
    Osami Sakata
    Shigeru Kimura
    Hiroki Edo
    Satoshi Iida
    Masataka Umeno
    Journal of Materials Science: Materials in Electronics, 2008, 19 : 189 - 193
  • [25] OBSERVATION OF PRECIPITATION IN SILICON CONTAINING OXYGEN BY X-RAY DIFFRACTION MICROSCOPY METHODS
    SULPINA, IL
    ACTA CRYSTALLOGRAPHICA, 1966, S 21 : A25 - &
  • [26] Substrate influence on the X-ray diffraction patterns of amorphous chalcogenide thin films deposited on silicon wafers
    Lorinczi, A
    THIN SOLID FILMS, 2002, 408 (1-2) : 282 - 285
  • [27] OBSERVATION OF LOCALLY DIFFUSED REGIONS IN SILICON WAFERS BY BERG-BARRETT X-RAY DIFFRACTION MICROGRAPHY
    JULEFF, EM
    WOLFSON, RG
    JOURNAL OF APPLIED PHYSICS, 1966, 37 (05) : 2178 - &
  • [28] Evaluation of retrogradation in microwave cooked rice using X-ray diffraction method.
    Yoshida S.
    Fukuoka M.
    Sakai N.
    Japan Journal of Food Engineering, 2010, 11 (02) : 85 - 90
  • [29] Evaluation of starch retrogradation by X-ray diffraction using a water-addition method
    Taguchi, Takumi
    Onishi, Misa
    Katsuno, Nakako
    Miwa, Noriko
    Oomoto, Chie
    Sato, Miho
    Sekita, Misa
    Yamaguchi, Hideyuki
    Imaizumi, Teppei
    Nishizu, Takahisa
    LWT-FOOD SCIENCE AND TECHNOLOGY, 2023, 173
  • [30] Probing oxygen ordering in YBCO by in situ high temperature resistivity and X-ray diffraction studies
    Rao, GVN
    Sastry, VS
    Hariharan, Y
    Seshagiri, V
    Radhakrishnan, TS
    BULLETIN OF MATERIALS SCIENCE, 1997, 20 (04) : 499 - 502
12345