共 50 条
- [1] EFFECT OF CRYSTAL PULLING RATE ON FORMATION OF CRYSTAL-ORIGINATED PARTICLES ON SI WAFERS JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1992, 31 (3B): : L293 - L295
- [2] Microstructure observation of 'crystal-originated particles' on silicon wafers Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1995, 34 (12 A): : 6303 - 6307
- [3] Microstructure observation of ''crystal-originated particles'' on silicon wafers JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (12A): : 6303 - 6307
- [4] Effect of crystal-originated particles (COPs) on ULSI process integrity 2008 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 46TH ANNUAL, 2008, : 711 - +
- [7] Influence of crystal-originated `particle' microstructure on silicon wafers on gate oxide integrity Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1997, 36 (10): : 6187 - 6194
- [8] Influence of crystal-originated ''particle'' microstructure on silicon wafers on gate oxide integrity JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (10): : 6187 - 6194
- [9] Crystal-originated particles on performance for Nano-generation IC process IEEE INTERNATIONAL SYMPOSIUM ON NEXT-GENERATION ELECTRONICS 2013 (ISNE 2013), 2013,
- [10] CRYSTAL-ORIGINATED SINGULARITIES ON SI WAFER SURFACE AFTER SC1 CLEANING JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (11): : L1947 - L1949