共 50 条
- [41] ELECTRICALLY ACTIVE INTERSTITIAL DEFECTS IN IRRADIATED N-TYPE SILICON SOVIET PHYSICS SEMICONDUCTORS-USSR, 1980, 14 (04): : 455 - 457
- [43] ROLE OF INTERSTITIAL ATOMS IN FORMATION OF RADIATION DEFECTS IN SILICON. Soviet Physics, Semiconductors (English translation of Fizika i Tekhnika Poluprovodnikov), 1976, 10 (06): : 644 - 647
- [44] Macropore formation on highly doped n-type silicon Physica Status Solidi (A) Applied Research, 2000, 182 (01): : 45 - 50
- [45] Macropore formation on highly doped n-type silicon PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2000, 182 (01): : 45 - 50
- [46] Controllable formation of porous structures on n-type silicon PHYSICS OF LOW-DIMENSIONAL STRUCTURES, 1997, 5-6 : 47 - 52
- [47] DEPENDENCES OF THE RATES OF FORMATION OF DEFECT COMPLEXES IN N-TYPE SILICON ON THE ELECTRON-IRRADIATION TEMPERATURE SOVIET PHYSICS SEMICONDUCTORS-USSR, 1987, 21 (03): : 352 - 353
- [48] EFFICIENCY OF FORMATION OF VACANCY AND INTERSTITIAL COMPLEXES BY IRRADIATION OF DISLOCATION-FREE N-TYPE SILICON SOVIET PHYSICS SEMICONDUCTORS-USSR, 1991, 25 (01): : 65 - 66
- [49] FORMATION OF DEFECTS IN N-TYPE INP AT HIGH IRRADIATION TEMPERATURES SOVIET PHYSICS SEMICONDUCTORS-USSR, 1991, 25 (02): : 161 - 163
- [50] Formation of Porous Silicon: Mechanism of Macropores Formation in n-Type Si SAINS MALAYSIANA, 2013, 42 (05): : 643 - 648