共 50 条
- [1] INFLUENCE OF THE CHARGE STATE OF PRIMARY DEFECTS ON THE FORMATION OF COMPLEXES IN N-TYPE SILICON SOVIET PHYSICS SEMICONDUCTORS-USSR, 1980, 14 (02): : 189 - 191
- [2] INFLUENCE OF THE IRRADIATION TEMPERATURE AND OF THE NATURE OF DOPANT ON THE FORMATION OF DEFECTS IN N-TYPE ELECTRON-IRRADIATED SILICON. Soviet Physics, Semiconductors (English translation of Fizika i Tekhnika Poluprovodnikov), 1974, 8 (03): : 303 - 305
- [3] INTERACTION OF DISORDERED REGIONS WITH POINT DEFECTS IN N-TYPE SILICON. 1978, 12 (06): : 656 - 658
- [4] INFLUENCE OF TEMPERATURE DURING 640-MeV PROTON IRRADIATION ON FORMATION OF RADIATION DEFECTS IN n-TYPE SILICON. Soviet physics. Semiconductors, 1980, 14 (10): : 1146 - 1148
- [5] ELECTRICALLY ACTIVE INTERSTITIAL DEFECTS IN IRRADIATED n-TYPE SILICON. Soviet physics. Semiconductors, 1980, 14 (04): : 455 - 457
- [7] NEW DONOR FORMATION IN n-TYPE CZOCHRALSKI-GROWN SILICON. Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes, 1985, 24 (11): : 1450 - 1453
- [8] ORIENTATION DEPENDENCE OF THE FORMATION OF RADIATION DEFECTS IN N-TYPE SILICON SOVIET PHYSICS-SOLID STATE, 1964, 6 (01): : 266 - 267
- [10] INFLUENCE OF ANODIC POLARIZATION CONDITIONS UNDER STEADY ILLUMINATION ON THE FORMATION AND PROPERTIES OF POROUS SURFACE LAYERS ON n-TYPE SILICON. Soviet electrochemistry, 1987, 22 (08): : 986 - 992