BIAS EFFECTS ON PREPARATION OF DOPED AMORPHOUS SILICON IN A TRIODE GLOW DISCHARGE.

被引：0

作者：

Aozasa, Masao ^{[1
]}

Pyon, Ryun Gill ^{[1
]}

Ando, Keiichi ^{[1
]}

机构：

[1] Osaka City Univ, Jpn, Osaka City Univ, Jpn

来源：

Memoirs of the Faculty of Engineering, Osaka City University | 1986年 / 27卷

关键词：

PHOTOCONDUCTING DEVICES - Manufacture;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Bias effects on the preparation of doped amorphous silicon are investigated using a triode glow discharge. The negative bias improves the quality of the phosphorus-doped amorphous silicon films, while it does not improve the quality of boron-doped films.

引用

页码：53 / 65

共 50 条

[21] DC MAGNETRON GLOW-DISCHARGE AMORPHOUS-SILICON
SMITH, GB
MCKENZIE, DR
SOLAR ENERGY MATERIALS, 1984, 11 (1-2): : 45 - 56
[22] THE GROWTH OF GLOW-DISCHARGE HYDROGENATED AMORPHOUS-SILICON
BHAT, PK
CHATHAM, H
SHING, YH
PERRY, JW
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1987, 97-8 : 1383 - 1386
[23] ELECTROPHOTOGRAPHIC STUDIES OF GLOW-DISCHARGE AMORPHOUS-SILICON
ODA, S
SAITO, Y
SHIMIZU, I
INOUE, E
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1981, 43 (06): : 1079 - 1089
[24] LASER ANNEALING OF GLOW-DISCHARGE AMORPHOUS-SILICON
SUSSMANN, RS
HARRIS, AJ
OGDEN, R
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) : 249 - 254
[25] AC CONDUCTION IN GLOW-DISCHARGE AMORPHOUS SILICON FILMS
NITTA, S
SHIMAKAWA, K
SAKAGUCHI, K
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1977, 24 (01) : 137 - 140
[26] BIAS ANNEALING OF DOPED AMORPHOUS-SILICON
STREET, RA
KAKALIOS, J
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1986, 54 (01): : L21 - L26
[27] PROPERTIES OF FLUORINATED GLOW-DISCHARGE AMORPHOUS-SILICON
JANAI, M
WEIL, R
PRATT, B
PHYSICAL REVIEW B, 1985, 31 (08): : 5311 - 5321
[28] THE ROLE OF ION-BOMBARDMENT IN THE RF-GLOW-DISCHARGE PREPARATION OF INTRINSIC AMORPHOUS-SILICON
CARABE, J
GANDIA, JJ
GUTIERREZ, MT
JOURNAL OF APPLIED PHYSICS, 1993, 73 (09) : 4618 - 4621
[29] PREPARATION OF AMORPHOUS NICKEL FILM CATALYSTS BY GLOW-DISCHARGE
IMANAKA, T
TAMAKI, J
TERANISHI, S
CHEMISTRY LETTERS, 1984, (03) : 449 - 450
[30] HETEROGENEITIES AND SURFACE EFFECTS IN GLOW-DISCHARGE DEPOSITED HYDROGENATED AMORPHOUS-SILICON FILMS
FRITZSCHE, H
THIN SOLID FILMS, 1982, 90 (02) : 119 - 129

← 1 2 3 4 5 →