Crystalline β-C3N4 films deposited on metallic substrates by microwave plasma chemical vapor deposition

被引：0
|
作者：
Gu, Y.S.
Zhang, Y.P.
Duan, Z.J.
Chang, X.R.
Tian, Z.Z.
Shi, D.X.
Ma, L.P.
Zhang, X.F.
Yuan, L.
机构：
[1] Department of Material Physics, Beijing Univ. of Sci. and Technology, Beijing 100083, China
[2] Beijing Laboratory of Vacuum Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China
来源：
Materials Science and Engineering A | 1999年 / 271卷 / 1-2期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：206 / 212
相关论文
共 50 条
  • [41] Synthesis of crystalline carbon nitride by microwave plasma chemical vapor deposition
    Jiang, JC
    Cheng, WJ
    Zhang, Y
    Zhu, HS
    Shen, DZ
    CROSS-DISCIPLINARY APPLIED RESEARCH IN MATERIALS SCIENCE AND TECHNOLOGY, 2005, 480 : 71 - 75
  • [42] A study of diamond like carbon/chromium films deposited by microwave plasma activated chemical vapor deposition
    Sahoo, Sambita
    Pradhan, S. K.
    Jeevitha, M.
    Bagchi, Sharmistha
    Barhai, P. K.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2014, 386 : 14 - 18
  • [43] MICROMECHANICAL PROPERTIES OF DIAMOND FILMS DEPOSITED BY MICROWAVE-PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION
    GARCIA, A
    FLANO, N
    VIVIENTE, JL
    ONATE, JI
    GOMEZALEIXANDRE, C
    SANCHEZGARRIDO, O
    DIAMOND AND RELATED MATERIALS, 1993, 2 (5-7) : 933 - 938
  • [44] Internal stress of a-C:H(N) films deposited by radio frequency plasma enhanced chemical vapor deposition
    Cheng, YH
    Wu, YP
    Chen, JG
    Qiao, XL
    Xie, CS
    DIAMOND AND RELATED MATERIALS, 1999, 8 (07) : 1214 - 1219
  • [45] Stress in microwave plasma chemical vapor deposited (MPCVD) diamond films
    Naseem, HA
    Haque, MS
    Beera, RA
    Brown, WD
    Malshe, AP
    PROCEEDINGS OF THE THIRTEENTH INTERNATIONAL CONFERENCE ON CHEMICAL VAPOR DEPOSITION, 1996, 96 (05): : 685 - 690
  • [46] [100]-textured growth of polycrystalline diamond films on alumina substrates by microwave plasma chemical vapor deposition
    Wang, LJ
    Lu, JF
    Su, QF
    Wu, NC
    Liu, JM
    Shi, WM
    Xia, YB
    MATERIALS LETTERS, 2006, 60 (19) : 2390 - 2394
  • [47] Formation of crystalline silicon carbon nitride films by microwave plasma-enhanced chemical vapor deposition
    Chen, LC
    Yang, CY
    Bhusari, DM
    Chen, KH
    Lin, MC
    Lin, JC
    Chuang, TJ
    DIAMOND AND RELATED MATERIALS, 1996, 5 (3-5) : 514 - 518
  • [48] Study on α-C:F films deposited by electron cyclotron resonance plasma chemical vapor deposition
    Ye, C
    Ning, ZY
    Cheng, SH
    Kang, J
    ACTA PHYSICA SINICA, 2001, 50 (04) : 784 - 789
  • [49] Crystalline β-C3N4 synthesized by MPCVD
    Gu, YS
    Zhang, YP
    Duan, ZJ
    Chang, XR
    Tian, ZZ
    Chen, NX
    Dong, C
    Shi, DX
    Zhang, XF
    Yuan, L
    JOURNAL OF MATERIALS SCIENCE, 1999, 34 (13) : 3117 - 3125
  • [50] Crystalline β-C3N4 synthesized by MPCVD
    Y. S. Gu
    Y. P. Zhang
    Z. J. Duan
    X. R. Chang
    Z. Z. Tian
    N. X. Chen
    C. Dong
    D. X. Shi
    X. F. Zhang
    L. Yuan
    Journal of Materials Science, 1999, 34 : 3117 - 3125
12345