Crystalline β-C3N4 films deposited on metallic substrates by microwave plasma chemical vapor deposition

被引：0
|
作者：
Gu, Y.S.
Zhang, Y.P.
Duan, Z.J.
Chang, X.R.
Tian, Z.Z.
Shi, D.X.
Ma, L.P.
Zhang, X.F.
Yuan, L.
机构：
[1] Department of Material Physics, Beijing Univ. of Sci. and Technology, Beijing 100083, China
[2] Beijing Laboratory of Vacuum Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China
来源：
Materials Science and Engineering A | 1999年 / 271卷 / 1-2期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：206 / 212
相关论文
共 50 条
  • [21] Evidence for continuous areas of crystalline β–C3N4 in sputter-deposited thin films
    A. K. M. S. Chowdhury
    D. C. Cameron
    M. S. J. Hashmi
    J. M. Gregg
    Journal of Materials Research, 1999, 14 : 2359 - 2363
  • [22] Deposition of micro-crystalline β-C3N4 films by an inductively-coupled-plasma (ICP) sputtering method
    Natl Cheng-Kung Univ, Tainan, Taiwan
    Japanese Journal of Applied Physics, Part 2: Letters, 1998, 37 (6 A):
  • [23] Deposition of micro-crystalline β-C3N4 films by an inductively-coupled-plasma (ICP) sputtering method
    Hsu, CY
    Hong, FCN
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1998, 37 (6A): : L675 - L678
  • [24] Pressure dependence of morphology and phase composition of SiC films deposited by microwave plasma chemical vapor deposition on cemented carbide substrates
    Yu, Sheng-Wang
    Fan, Peng-Wei
    Tang, Wei-Zhong
    Li, Xiao-Jing
    Hu, Hao-Lin
    Hei, Hong-Jun
    Zhang, Si-Kai
    Lu, Fan-Xiu
    THIN SOLID FILMS, 2011, 520 (02) : 828 - 832
  • [25] Deposition of textured diamond films on Si (100) substrates via microwave plasma chemical vapor deposition
    张文军
    胡博
    韩立
    张仿清
    陈光华
    Chinese Science Bulletin, 1995, (09) : 727 - 728
  • [26] Synthesis and characterization of C3N4 crystalline films on silicon
    Chen, Y
    Guo, LP
    Chen, F
    Wang, EG
    JOURNAL OF PHYSICS-CONDENSED MATTER, 1996, 8 (45) : L685 - L690
  • [27] PREPARATION OF AL-C-O-N FILMS BY MICROWAVE PLASMA CHEMICAL VAPOR-DEPOSITION
    SOMENO, Y
    SASAKI, M
    HIRAI, T
    NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1993, 101 (02): : 211 - 216
  • [28] Structure and composition of crystalline carbon nitride films synthesized by microwave plasma chemical vapor deposition
    Zhang, YP
    Gu, YS
    Chang, XT
    Tian, ZZ
    Zhang, XF
    JOURNAL OF UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING, 2000, 7 (04): : 282 - 285
  • [29] On the structure and composition of crystalline carbon nitride films synthesized by microwave plasma chemical vapor deposition
    Zhang, YP
    Gu, YS
    Chang, XR
    Tian, ZZ
    Shi, DX
    Zhang, XF
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2000, 78 (01): : 11 - 15
  • [30] tructure and Composition of Crystalline Carbon Nitride Films Synthesized by Microwave Plasma Chemical Vapor Deposition
    Yongping Zhang
    Journal of University of Science and Technology Beijing(English Edition), 2000, (04) : 282 - 285
12345