Crystalline β-C3N4 films deposited on metallic substrates by microwave plasma chemical vapor deposition

被引：0
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作者：
Gu, Y.S.
Zhang, Y.P.
Duan, Z.J.
Chang, X.R.
Tian, Z.Z.
Shi, D.X.
Ma, L.P.
Zhang, X.F.
Yuan, L.
机构：
[1] Department of Material Physics, Beijing Univ. of Sci. and Technology, Beijing 100083, China
[2] Beijing Laboratory of Vacuum Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China
来源：
Materials Science and Engineering A | 1999年 / 271卷 / 1-2期
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页码：206 / 212
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