Effect of N2 addition on aluminum alloy etching by electron cyclotron resonance reactive ion etching and magnetically enhanced reactive ion etching

被引：0
|
作者：
Kusumi, Yoshihiro [1 ]
Fujiwara, Nobuo [1 ]
Matsumoto, Junko [1 ]
Yoneda, Masahiro [1 ]
机构：
[1] Mitsubishi Electric Corp, Hyogo, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 4 B期
关键词：
Reactive ion etching;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
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页码：2147 / 2151
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