Formation of Ta2O5 films by laser ablation from Ta target under oxygen atmosphere

被引：0

作者：

Yano, T. ^{[1
]}

Ooie, T. ^{[1
]}

Yoneda, M. ^{[1
]}

Katsumura, M. ^{[1
]}

Hino, T. ^{[1
]}

Araki, T. ^{[1
]}

机构：

[1] Shikoku Natl Industrial Research, Inst, Takamatsu, Japan

来源：

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals | 1997年 / 61卷 / 01期

关键词：

D O I：

暂无

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学科分类号：

摘要：

引用

页码：71 / 76

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