Measuring p-n junction minority carrier diffusion length by microwave photoconductivity spectrum instrument

被引：0

作者：

Chu, Youling ^{[1
]}

Wang, Zongxin ^{[1
]}

Wu, Tianfu ^{[1
]}

机构：

[1] Fudan Univ, Shanghai, China

来源：

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors | 1993年 / 14卷 / 12期

关键词：

Photoelectron spectroscopy;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：754 / 759

共 50 条

[1] Use of a laser beam interference technique for the determination of the minority carrier diffusion length in layers of a p-n junction
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