Raman and Rutherford backscattering analyses of cubic SiC thin films grown on Si by vertical chemical vapor deposition

被引:0
|
作者
Natl Univ of Singapore, Singapore, Singapore [1 ]
机构
来源
Thin Solid Films | / 1卷 / 1-7期
关键词
We acknowledge Profs. S. Perkowitz; K.T. Yue and A. Rohatgi for their support and help in this work. This work was partially supportedb y the NASA contract no. NAGW-1192 through the Center for Commercial Development of Space Power and Advanced Electronics at Auburn University;
D O I
暂无
中图分类号
学科分类号
摘要
23
引用
收藏
相关论文
共 50 条
  • [21] 2H-SiC films grown by laser chemical vapor deposition
    Ito, Akihiko
    Kanno, Hitoshi
    Goto, Takashi
    JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 2015, 35 (16) : 4611 - 4615
  • [22] Evaluation of strain in AN thin films grown on sapphire and 6H-SiC by metalorganic chemical vapor deposition
    Kato, Naoto
    Inushima, Takashi
    Physica Status Solidi C - Current Topics in Solid State Physics, Vol 3, No 6, 2006, 3 (06): : 1671 - 1674
  • [23] STRESS MODIFICATION AND CHARACTERIZATION OF THIN SIC FILMS GROWN BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
    SCHLIWINSKI, HJ
    PELKA, M
    BUCHMANN, LM
    WINDBRACKE, W
    LANGE, P
    CSEPREGI, L
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1992, 11 (1-4): : 73 - 77
  • [24] Growth of cubic SiC thin films on Si(001) by high vacuum chemical vapor deposition using 1,3-disilabutane and an investigation of the effect of deposition pressure
    Boo, JH
    Lim, DC
    Lee, SB
    Lee, KW
    Sung, MM
    Kim, Y
    Yu, KS
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (04): : 1870 - 1875
  • [25] ELECTRICAL-PROPERTIES OF UNDOPED AND ION-IMPLANTED CUBIC SIC GROWN ON SI(100) BY CHEMICAL VAPOR-DEPOSITION
    SHIBAHARA, K
    TAKEUCHI, T
    NISHINO, S
    MATSUNAMI, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (08): : 1341 - 1347
  • [26] PROPERTIES OF EPITAXIAL SI FILMS GROWN ON YTTRIA-STABILIZED CUBIC ZIRCONIA SUBSTRATES BY CHEMICAL VAPOR-DEPOSITION
    GOLECKI, I
    MANASEVIT, HM
    YANG, JJ
    MOUDY, LA
    MEE, JE
    MAGEE, TJ
    JOURNAL DE PHYSIQUE, 1982, 43 (NC-5): : 427 - 427
  • [27] Epitaxial growth of cubic SiC thin films on silicon using single molecular precursors by metalorganic chemical vapor deposition
    Boo, JH
    Lee, SB
    Lee, KW
    Yu, KS
    Kim, Y
    Yeon, SH
    Jung, IN
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2001, 19 (04): : 1887 - 1893
  • [28] Preparation of Fe-Si thin films by chemical vapor deposition
    Mukaida, M
    Hiyama, I
    Tsunoda, T
    Imai, Y
    XVII INTERNATIONAL CONFERENCE ON THERMOELECTRICS, PROCEEDINGS ICT 98, 1998, : 237 - 240
  • [29] Growth and characterization of GaN thin films on β-SiC/Si substrate using rapid thermal chemical vapor deposition
    Mo, YH
    Nahm, KS
    Yang, SH
    Kim, KC
    Lee, WH
    Suh, EK
    Lim, KY
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 1999, 34 : S364 - S369
  • [30] Strain in GaP films heteroepitaxially grown on Si by metallorganic chemical vapor deposition
    Nakamura, K.
    Fuyuki, T.
    Matsunami, H.
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1998, 37 (08): : 4231 - 4233