GET SUBMICROMETER RESOLUTION WITH OPTICAL LITHOGRAPHY.

被引：0

作者：

Schoueffel, James A. ^{[1
]}

Oldham, William G. ^{[1
]}

机构：

[1] ATEQ Corp, ATEQ Corp

来源：

Research and Development (Barrington, Illinois) | 1987年 / 29卷 / 01期

关键词：

INTEGRATED CIRCUIT MANUFACTURE - INTEGRATED CIRCUITS; VLSI - ION BEAMS - Applications - LASERS - Applications - X-RAYS - Applications;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

In the manufacture of integrated circuits, lithography is the most fundamental process step. In this article, one is concerned only with printing a pattern in photoresist on the surface of the silicon wafer. The dominance of optical lithography stems from its capability for meeting the exacting requirements of the manufacturing process. Some topics discussed are the following: the lithographic process, electron beam pattern generators, ion beams; soft x-rays, compact synchrotrons, projection optical lithography, and lasers in optical lithography.

引用

页码：92 / 95

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