Characterization of a RF/dc-magnetron discharge for the sputter deposition of transparent and highly conductive ITO films

被引：0
|
作者：
Bender, M. [1 ,3 ]
Trube, J. [2 ]
Stollenwerk, J. [2 ]
机构：
[1] Institut für Angewandte Physik, TU Darmstadt, Schloßgartenstr. 7, D-64287 Darmstadt, Germany
[2] Balzers Prozeß-Systeme GmbH, Siemensstr. 100, D-63755 Alzenau, Germany
[3] Materials Group, FORTH/IESL, Vassilika Vouton, P.O. Box 1527, GR-71110 Heraklion, Greece
来源：
Applied Physics A: Materials Science and Processing | 1999年 / 69卷 / 04期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：397 / 401
相关论文
共 50 条
  • [41] Preparing conductive transparent ITO films by RF magnetron sputtering with low self bias voltage and study on its self bias
    Ishida, T., 2001, Vacuum Society of Japan (44):
  • [42] RF-superimposed DC and pulsed DC sputtering for deposition of transparent conductive oxides
    Stowell, Michael
    Mueller, Joachim
    Ruske, Manfred
    Lutz, Mark
    Linz, Thomas
    THIN SOLID FILMS, 2007, 515 (19) : 7654 - 7657
  • [43] Growth of highly transparent and conductive CdO thin films deposited at different thicknesses by RF reactive magnetron sputtering
    Kumar, G. Anil
    Reddy, M. V. Ramana
    Reddy, K. Narasimha
    MATERIALS RESEARCH INNOVATIONS, 2015, 19 (03) : 204 - 211
  • [44] Effects of deposition pressure on the properties of transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering
    Ma, Quan-Bao
    Ye, Zhi-Zhen
    He, Hai-Ping
    Zhu, Li-Ping
    Zhao, Bing-Hui
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2007, 10 (4-5) : 167 - 172
  • [45] The effect of deposition times in DC-magnetron sputtering on micromorphology of TiO2 thin films
    Rezaee, Sahar
    MICROSCOPY RESEARCH AND TECHNIQUE, 2021, 84 (07) : 1475 - 1483
  • [46] Properties of Al films Depend On Substrate Temperature by DC Magnetron Sputter Deposition
    Shen, Yi
    Yao, Ruohe
    NANOTECHNOLOGY AND PRECISION ENGINEERING, PTS 1 AND 2, 2013, 662 : 413 - +
  • [47] Transparent Conductive In and Ga Doped ZnO/Cu Bi-Layered Films Deposited by DC and RF Magnetron Sputtering
    Moon, Hyun-Joo
    Song, Young-Hwan
    Oh, Jung-Hyun
    Heo, Sung-Bo
    Kim, Daeil
    KOREAN JOURNAL OF METALS AND MATERIALS, 2016, 54 (06): : 450 - 454
  • [48] Highly transparent and conductive ZrO-In2O3 thin films prepared by dc magnetron sputtering
    Minami, T
    Kakumu, T
    Takeda, Y
    Takata, S
    THIN SOLID FILMS, 1996, 290 : 1 - 5
  • [49] Highly infrared reflective Behavior of transparent conductive ZnO:Ga films synthesized by DC reactive magnetron sputtering
    Ma, Quan-Bao
    Ye, Zhi-Zhen
    He, Hai-Ping
    Luo, Yong
    Zhu, Li-Ping
    Huang, Jing-Yun
    Zhang, Yin-Zhu
    Zhao, Bing-Hui
    CHEMPHYSCHEM, 2008, 9 (04) : 529 - 532
  • [50] rf magnetron sputter deposition of transparent conducting Nb-doped TiO2 films on SrTiO3
    Gillispie, Meagen A.
    van Hest, Maikel F. A. M.
    Dabney, Matthew S.
    Perkins, John D.
    Ginley, David S.
    JOURNAL OF APPLIED PHYSICS, 2007, 101 (03)
12345