Characterization of a RF/dc-magnetron discharge for the sputter deposition of transparent and highly conductive ITO films

被引：0
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作者：
Bender, M. [1 ,3 ]
Trube, J. [2 ]
Stollenwerk, J. [2 ]
机构：
[1] Institut für Angewandte Physik, TU Darmstadt, Schloßgartenstr. 7, D-64287 Darmstadt, Germany
[2] Balzers Prozeß-Systeme GmbH, Siemensstr. 100, D-63755 Alzenau, Germany
[3] Materials Group, FORTH/IESL, Vassilika Vouton, P.O. Box 1527, GR-71110 Heraklion, Greece
来源：
Applied Physics A: Materials Science and Processing | 1999年 / 69卷 / 04期
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页码：397 / 401
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