Novel phase-modulated excimer-laser crystallization method of silicon thin films

被引：0

作者：

Oh, Chang-Ho ^{[1
]}

Ozawa, Motohiro ^{[1
]}

Matsumura, Masakiyo ^{[1
]}

机构：

[1] Tokyo Inst of Technology, Tokyo, Japan

来源：

Japanese Journal of Applied Physics, Part 2: Letters | 1998年 / 37卷 / 5 A期

关键词：

Crystallization - Excimer lasers - Grain growth - Grain size and shape - Light interference - Masks - Phase modulation - Semiconducting silicon - Thin film transistors;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

We propose a novel excimer-laser crystallization method that uses a phase-shift mask for large-grain growth of Si thin films on the glassy substrate. Due to interference effects of the laser light, the phase difference of light at the mask results in spatial modulation of light intensity at the sample surface, which triggers the lateral grain growth. Grains as large as 7 μm could be grown by a single-shot irradiation.

引用

共 50 条

[1] A novel phase-modulated excimer-laser crystallization method of silicon thin films
Oh, CH
Ozawa, M
Matsumura, M
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1998, 37 (5A): : L492 - L495
[2] New Widening Method of Depth of Focus for Phase-Modulated Excimer-Laser Crystallization
Taniguchi, Yukio
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Azuma, Kazufumi
Matsumura, Masakiyo
JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (01)
[3] Novel optical method for widening process window of phase-modulated excimer laser crystallization
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JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (02) : 947 - 955
[4] Novel optical method for widening process window of phase-modulated excimer laser crystallization
Advanced LCD Technologies Development Center Co., Ltd., 292 Yoshida-cho, Totsuka-ku, Yokohama 244-0817, Japan
不详
Jpn. J. Appl. Phys., 2 PART 1 (947-955):
[5] Selective area excimer-laser crystallization of amorphous silicon thin films
Viatella, J
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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1999, 146 (12) : 4605 - 4610
[6] Grain matrix made with excimer-laser crystallization of thin silicon films
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Ishihara, R
SOLID STATE PHENOMENA, 1999, 67-8 : 169 - 173
[7] Grain matrix made with excimer-laser crystallization of thin silicon films
Van Der Wilt, P.Ch.
Ishihara, R.
Solid State Phenomena, 1999, 67 : 169 - 173
[8] EXCIMER-LASER CRYSTALLIZATION OF AMORPHOUS-SILICON FILMS
TANABE, H
SERA, K
NAKAMURA, K
HIRATA, K
YUDA, K
OKUMURA, F
NEC RESEARCH & DEVELOPMENT, 1994, 35 (03): : 254 - 260
[9] A NOVEL DOUBLE-PULSE EXCIMER-LASER CRYSTALISATION METHOD OF SILICON THIN-FILMS
ISHIHARA, R
MATSUMURA, M
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (8A): : 3976 - 3981
[10] Optimization of phase-modulated excimer-laser annealing method for growing highly-packed large-grains in Si thin-films
Oh, CH
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APPLIED SURFACE SCIENCE, 2000, 154 : 105 - 111

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