Effect of argon addition on the microstructure, texture and phases of silicon carbide prepared by chemical vapor deposition

被引：0

作者：

Lu, Yang-Ming ^{[1
]}

Hon, Min-Hsiung ^{[1
]}

机构：

[1] Natl Cheng Kung Univ, Tainan, Taiwan

来源：

Journal of the Ceramic Society of Japan. International ed. | 1991年 / 99卷 / 12期

关键词：

Argon effects - Crystal surface - Isotropic pyrolytic graphite - Methyltrichlorosilane - Silicon single crystal - X ray diffractometry;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：1136 / 1139

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