CONTACTLESS MEASUREMENT OF SHORT CARRIER LIFETIME IN HEAT-TREATED N-TYPE SILICON.

被引:0
|
作者
Yamazaki, Tatsuya
Ogita, Yoh-ichiro
Ikegami, Yoshikazu
Onaka, Hiroshi
Ohta, Eiji
Sakata, Makoto
机构
来源
| 1600年 / 23期
关键词
D O I
暂无
中图分类号
TM2 [电工材料]; TN [电子技术、通信技术];
学科分类号
0805 ; 080502 ; 080801 ; 0809 ;
摘要
Sub-microsecond excess carrier lifetimes have been measured by a contactless method and the electrical properties have been investigated by the isothermal capacitance method in heat-treated N-type silicon. It is found that the thermally induced donor level at E//v plus 0. 39 ev acts as recombination center. By using the present contactless measurement system, it becomes possible to accurately measure lifetimes as short as 0. 07 mu sec, and resistivity-lifetime products, rho tau equals 0. 1 OMEGA cm multiplied by (times) mu sec, have been achieved.
引用
收藏
相关论文
共 50 条
  • [41] CONTACTLESS MEASUREMENT OF BULK FREE-CARRIER LIFETIME IN CAST POLYCRYSTALLINE SILICON INGOTS
    JOHNSON, SM
    JOHNSON, LG
    JOURNAL OF APPLIED PHYSICS, 1986, 60 (06) : 2008 - 2015
  • [42] PARAMETERS OF ANNEALING-TRANSFORMED DISORDERED REGIONS IN N-TYPE SILICON.
    Vasil'ev, A.V.
    Smagulova, S.A.
    Soviet physics. Semiconductors, 1983, 17 (01): : 18 - 21
  • [43] On the impact of metal impurities on the carrier lifetime in n-type germanium
    Gaubas, Eugenijus
    Vanhellemont, Jan
    Simoen, Eddy
    Theuwis, Antoon
    Clauws, Paul
    SEMICONDUCTOR DEFECT ENGINEERING-MATERIALS, SYNTHETIC STRUCTURES AND DEVICES II, 2007, 994 : 263 - +
  • [44] MEASUREMENT OF MINORITY-CARRIER TRANSPORT PARAMETERS IN HEAVILY DOPED N-TYPE SILICON
    DELALAMO, J
    SWANSON, RM
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (11) : 2555 - 2555
  • [45] Imaging Carrier Dynamics on the Surface of the N-type Silicon
    Najafi, Ebrahim
    ULTRAFAST NONLINEAR IMAGING AND SPECTROSCOPY V, 2017, 10380
  • [46] Minority-carrier lifetime and defect content of n-type silicon grown by the noncontact crucible method
    Kivambe, Maulid
    Powell, DouglasM.
    Castellanos, Sergio
    Jensen, Mallory Ann
    Morishige, Ashley E.
    Nakajima, Kazuo
    Morishita, Kohei
    Murai, Ryota
    Buonassisi, Tonio
    JOURNAL OF CRYSTAL GROWTH, 2014, 407 : 31 - 36
  • [47] Exceeding 3 ms minority carrier lifetime in n-type non-contact crucible silicon
    Castellanos, Sergio
    Kivambe, Maulid
    Jensen, Mallory A.
    Powell, Douglas M.
    Nakajima, Kazuo
    Morishita, Kohei
    Murai, Ryota
    Buonassisi, Tonio
    PROCEEDINGS OF THE 6TH INTERNATIONAL CONFERENCE ON CRYSTALLINE SILICON PHOTOVOLTAICS (SILICONPV 2016), 2016, 92 : 779 - 784
  • [48] POSITRON LIFETIME MEASUREMENTS IN N-TYPE AND P-TYPE SILICON
    DORIKENS, M
    DAUWE, C
    DORIKENS.L
    APPLIED PHYSICS, 1974, 4 (03): : 271 - 272
  • [49] VOn (n≥3) defects in irradiated and heat-treated silicon
    Murin, LI
    Lindström, JL
    Svensson, BG
    Markevich, VP
    Peaker, AR
    Londos, CA
    GETTERING AND DEFECT ENGINEERING IN SEMICONDUCTOR TECHNOLOGY XI, 2005, 108-109 : 267 - 272
  • [50] INFLUENCE OF THE CHARGE STATE OF PRIMARY DEFECTS ON THE FORMATION OF COMPLEXES IN n-TYPE SILICON.
    Gubskaya, V.I.
    Kuchinskii, P.V.
    Lomako, V.M.
    Soviet physics. Semiconductors, 1980, 14 (02): : 189 - 191