TUNGSTEN DISILICIDE FORMATION IN CODEPOSITED AMORPHOUS WSix ALLOY THIN FILMS.

被引：0
|
作者：
Nava, F. [1 ]
Weiss, B.Z. [1 ]
Ahn, K. [1 ]
Tu, K.N. [1 ]
机构：
[1] Univ di Modena, Modena, Italy, Univ di Modena, Modena, Italy
来源：
Vide, les Couches Minces | 1987年 / 42卷 / 236期
关键词：
RESISTIVITY MAXIMUM - SHEET RESISTIVITY - TUNGSTEN DISILICIDE;
D O I：
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学科分类号：
摘要：
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页码：225 / 228
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