Oxidation properties of silicon nitride thin films fabricated by double tubed coaxial line type microwave plasma chemical vapor deposition

被引：0
|
作者：
Kato, Isamu [1 ]
Numada, Kouji [1 ]
Kiyota, Yukihiro [1 ]
机构：
[1] Waseda Univ, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1988年 / 27卷 / 08期
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D O I：
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学科分类号：
摘要：
8
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页码：1401 / 1405
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