New photobleachable positive resist for KrF excimer laser lithography

被引：0
|
作者：
Endo, Masayuki [1 ]
Tani, Yoshiyuki [1 ]
Sasago, Masaru [1 ]
Ogawa, Kazufumi [1 ]
Nomura, Noboru [1 ]
机构：
[1] Matsushita Electric Ind Co, Japan
来源：
| 1600年 / 27期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Sulfonamide-phenolic resin negative resist for KrF excimer laser lithography
    Yamaoka, Tsuguo, 1600, (28):
  • [22] RESIST HEATING IN EXCIMER LASER LITHOGRAPHY
    ABE, T
    ARIKADO, T
    TAKIGAWA, T
    JOURNAL OF APPLIED PHYSICS, 1988, 63 (04) : 1235 - 1237
  • [23] TETRAHYDROPYRANYL AND TETRAHYDROFURANYL PROTECTED POLYHYDROXYSTYRENES IN CHEMICAL AMPLIFICATION RESIST SYSTEMS FOR KRF EXCIMER LASER LITHOGRAPHY
    HAYASHI, N
    HESP, SMA
    UENO, T
    TORIUMI, M
    IWAYANAGI, T
    NONOGAKI, S
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1989, 198 : 93 - PMSE
  • [24] RECENT PROGRESS IN KRF EXCIMER LASER LITHOGRAPHY
    NAKASE, M
    IEICE TRANSACTIONS ON ELECTRONICS, 1993, E76C (01) : 26 - 31
  • [25] QUARTER MICRON KRF EXCIMER LASER LITHOGRAPHY
    SASAGO, M
    ENDO, M
    TANI, Y
    KOBAYASHI, S
    KOIZUMI, T
    MATSUO, T
    YAMASHITA, K
    NOMURA, N
    IEICE TRANSACTIONS ON ELECTRONICS, 1993, E76C (04) : 582 - 587
  • [26] AZIDE-STYRENE RESIN NEGATIVE DEEP UV RESIST FOR KRF EXCIMER LASER LITHOGRAPHY
    ENDO, M
    TANI, Y
    SASAGO, M
    NOMURA, N
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (09) : 2615 - 2618
  • [27] ORTHO-NITROBENZYL ESTER BASED DEEP UV RESIST FOR KRF EXCIMER LASER LITHOGRAPHY
    ENDO, M
    TANI, Y
    SASAGO, M
    NOMURA, N
    POLYMER JOURNAL, 1989, 21 (08) : 603 - 607
  • [28] Lithography Technology Using a KrF Excimer Laser
    Yamaguchi, A.
    Nakao, S.
    Wakamiya, W.
    Mitsubishi Denki Giho, 71 (03):
  • [29] NEW KRF AND ARF EXCIMER-LASER FOR ADVANCED DUV LITHOGRAPHY
    ENDERT, H
    PATZEL, R
    POWELL, M
    REBHAN, U
    BASTING, D
    MICROELECTRONIC ENGINEERING, 1995, 27 (1-4) : 221 - 224
  • [30] KrF excimer laser lithography with a dummy diffraction mask
    Kim, DH
    Park, BS
    Chung, HB
    Lee, JH
    Yoo, HJ
    Oh, YH
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 1996, 29 (03) : 317 - 320
12345