New photobleachable positive resist for KrF excimer laser lithography

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作者：
Endo, Masayuki [1 ]
Tani, Yoshiyuki [1 ]
Sasago, Masaru [1 ]
Ogawa, Kazufumi [1 ]
Nomura, Noboru [1 ]
机构：
[1] Matsushita Electric Ind Co, Japan
来源：
| 1600年 / 27期
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