Effects of tin concentrations on structural characteristics and electrooptical properties of tin-doped indium oxide films prepared by RF magnetron sputtering

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作者：
Yi, Choong Hoon [1 ]
Yasui, Itaru [1 ]
Shigesato, Yuzo [1 ]
机构：
[1] Univ of Tokyo, Tokyo, Japan
来源：
| 1600年 / JJAP, Minato-ku, Japan卷 / 34期
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Semiconducting films;
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