Effects of tin concentrations on structural characteristics and electrooptical properties of tin-doped indium oxide films prepared by RF magnetron sputtering

被引：0
|
作者：
Yi, Choong Hoon [1 ]
Yasui, Itaru [1 ]
Shigesato, Yuzo [1 ]
机构：
[1] Univ of Tokyo, Tokyo, Japan
来源：
| 1600年 / JJAP, Minato-ku, Japan卷 / 34期
关键词：
Semiconducting films;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [11] Comparison of tin-doped indium oxide films fabricated by spray pyrolysis and magnetron sputtering
    Malik, Oleksandr
    De la Hidalga-Wade, Francisco Javier
    CRYSTAL RESEARCH AND TECHNOLOGY, 2015, 50 (07) : 516 - 521
  • [12] Study on crystallinity of tin-doped indium oxide films deposited by DC magnetron sputtering
    Song, PK
    Shigesato, Y
    Yasui, I
    Ow-Yang, CW
    Paine, DC
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (4A): : 1870 - 1876
  • [13] Optical and electrical properties of tin-doped indium oxide transparent conducting films deposited by magnetron sputtering
    Zhong, Z.-Y. (zyzhongzy@163.com), 1600, Chinese Ceramic Society, Baiwanzhuang, Beijing, 100831, China (42):
  • [14] CHARACTERISTICS OF INDIUM TIN OXIDE-FILMS DEPOSITED BY RF MAGNETRON SPUTTERING
    JOSHI, RN
    SINGH, VP
    MCCLURE, JC
    THIN SOLID FILMS, 1995, 257 (01) : 32 - 35
  • [15] Characteristics of indium tin oxide films deposited by DC and RF magnetron sputtering
    Deng, W.
    Ohgi, T.
    Nejo, H.
    Fujita, D.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2001, 40 (5 A): : 3364 - 3369
  • [16] Characteristics of indium tin oxide films deposited by DC and RF magnetron sputtering
    Deng, WL
    Ohgi, T
    Nejo, H
    Fujita, D
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (5A): : 3364 - 3369
  • [17] Effects of hydrogen gas on properties of tin-doped indium oxide films deposited by radio frequency magnetron sputtering method
    Kim, Do-Geun
    Lee, Sunghun
    Lee, Gun-Hwan
    Kwon, Sik-Chol
    THIN SOLID FILMS, 2007, 515 (17) : 6949 - 6952
  • [18] Properties of indium tin oxide (ITO) films prepared by rf reactive magnetron sputtering at different pressures
    Meng, LJ
    dosSantos, MP
    THIN SOLID FILMS, 1997, 303 (1-2) : 151 - 155
  • [19] Properties of indium tin oxide films prepared by rf reactive magnetron sputtering at different substrate temperature
    Meng, LJ
    dos Santos, MP
    THIN SOLID FILMS, 1998, 322 (1-2) : 56 - 62
  • [20] Preparation and characteristics of Nb-doped indium tin oxide thin films by RF magnetron sputtering
    Li S.-n.
    Ma R.-x.
    He L.-w.
    Xiao Y.-q.
    Hou J.-g.
    Jiao S.-q.
    Optoelectronics Letters, 2012, 8 (6) : 460 - 463
12345