共 50 条
- [31] Optical and Electrical Characteristics of Fluorocarbon Films Deposited in a High-Density C4F8 Plasma KOREAN CHEMICAL ENGINEERING RESEARCH, 2021, 59 (02): : 254 - 259
- [34] Loss processes of F atoms in low-pressure, high-density CF4 plasmas with the admixture of H2 Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (7 B): : 4373 - 4376
- [35] Loss processes of F atoms in low-pressure, high-density CF4 plasmas with the admixture of H2 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (7B): : 4373 - 4376
- [36] Quantitative analysis of CF4 produced in the SiO2 etching process using c-C4F8, C3F8, and C2F6 plasmas by in situ mass spectrometry JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2004, 43 (01): : 342 - 346
- [37] Absolute density and reaction kinetics of fluorine atoms in high-density c-C4F8 plasmas J Appl Phys, 12 (7482):