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- [21] Role of reaction products in F- production in low-pressure, high-density CF4 plasmas JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (10): : 6084 - 6089
- [22] Role of reaction products in F- production in low-pressure, high-density CF4 plasmas Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (10): : 6084 - 6089
- [28] A Comparison of CF4, CHF3 and C4F8 + Ar/O2 Inductively Coupled Plasmas for Dry Etching Applications Plasma Chemistry and Plasma Processing, 2021, 41 : 1671 - 1689