Effects of helicon-wave-plasma etching on the charging damage of aluminum interconnects

被引：0
|
作者：
Lin, W. [1 ]
Kang, T.-K. [1 ]
Perng, Y.-Ch. [1 ]
Dai, B.-T. [1 ]
Cheng, H.-Ch. [1 ]
机构：
[1] Natl Chiao Tung Univ, Hsinchu, Taiwan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1998年 / 37卷 / 07期
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页码：3867 / 3870
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